Polymers for photoresists
Daicel’s polymers for photoresists are made from various monomers, including over ten in-house ones. We can offer you extra high purity and low metal products. We can also accept contract manufacturing.
- For Semiconductor
- For FPD
CELGRAPHY®
- Our polymers are main polymers for ArF or EUV resists used in the manufacturing of state-of-art semiconductors.
- We can handle acrylic, methacrylic, and hydroxystyrene type monomers.
- We can control polymer structures precisely.
- CELGRAPHY® are registered trademarks of the Daicel group.
- Example Products
- copolymer of various monomers
