Polymers for photoresists

Daicel’s polymers for photoresists are made from various monomers, including over ten in-house ones. We can offer you extra high purity and low metal products. We can also accept contract manufacturing.


  • Our polymers are main polymers for ArF or EUV resists used in the manufacturing of state-of-art semiconductors.
  • We can handle acrylic, methacrylic, and hydroxystyrene type monomers.
  • We can control polymer structures precisely.
  • CELGRAPHY® are registered trademarks of the Daicel group.
Example Products
copolymer of various monomers
For Semiconductor